Measurement of Pitch, Yaw, Roll, and Vertical Displacement in Precision Stages

・Issues

In precision stages and semiconductor manufacturing equipment, pitch, yaw, roll, and vertical displacement generated during high-speed, long-stroke travel are critical evaluation parameters that affect product quality. However, conventional measurement fixtures and complex setups make it difficult to evaluate these minute deviations—on the order of several micrometers and several arcseconds—quickly and easily.

・Solutions

By combining an HR-1100 for pitch and yaw with an SH-3100 for roll and vertical displacement, the entire change in stage orientation during motion can be visualized in real time and without contact.

Simultaneous four-axis measurement

Pitch, yaw, roll, and vertical displacement are measured simultaneously.

Real-time measurement

The system identifies when, where, and by how much the stage deviates during travel in real time. This helps improve stage performance and speeds up troubleshooting.